We are proud to announce that 国产原创 has been awarded $965,000 by the National Science Foundation (NSF) for the acquisition of a 50 kV, high-throughput electron beam lithography (e-beam) tool. This grant, part of the NSF鈥檚 Major Research Instrumentation (MRI) program, represents a significant step forward for research, education, and outreach at 国产原创.
The project, titled “Equipment: MRI: Track 1 Acquisition of a 50 kV, High-Throughput Electron Beam Lithography Tool for Research, Education, and Outreach at 国产原创,” is led by Josh Caldwell, with co-investigators Richard Mu (Tennessee State University), Sharon Weiss, James McBride, and Justus Ndukaife contributing their expertise.
This advanced e-beam lithography tool will be installed in the 国产原创 Institute for Nanoscale Science and Engineering (VINSE) cleanroom and enable groundbreaking research across various fields, enhance collaboration between institutions, and provide unparalleled educational opportunities for students. It also demonstrates our commitment to advancing both fundamental science and its applications in technology and innovation.
We extend our gratitude to the NSF for supporting this transformative project and to the incredible team of investigators who made this possible. Stay tuned for updates on the installation and use of this cutting-edge equipment!